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Tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionate) Cerium for the Deposition of Hydrophobic Coatings

The date of: 2025-06-17
viewed: 5

来源:ACS Pulications

Cerium oxide thin films represent an important approach to hydrophobic, self-cleaning solar modules, offering significant potential for photovoltaic applications. These coatings provide a durable, long-lasting alternative to conventional self-cleaning surface technologies, which often rely on polymer-based films prone to degradation over time. Here, we present the synthesis of tetrakis(2,2,6,6-tetramethyl-3,5-heptanedionate) cerium ([Ce(thd)4]) for the deposition of hydrophobic cerium oxide thin films by aerosol-assisted chemical vapor deposition (AACVD). The use of [Ce(thd)4] as a precursor led to the deposition of cerium oxide coatings onto fluorine-doped tin oxide (FTO)-coated glass substrates. Water contact angles (WCA’s) of 91–101.1° were observed for films deposited at temperatures of 400–500 °C. Investigation into the influence of the substrate on the hydrophobicity of cerium oxide films demonstrated that FTO-coated glass offers a more favorable surface morphology compared to that of barrier glass. The deposited cerium oxide thin films were characterized by surface analysis techniques for the different deposition temperatures. X-ray photoelectron spectroscopy (XPS) analysis of the adhered thin films revealed a transition from a mixed-phase system of Ce3+ and Ce4+ to a composition dominated exclusively by Ce4+.

there are no reports on the deposition of such thin films via AACVD that exhibit intrinsic hydrophobicity. Hence, the growth of cerium oxide films is still a novel development among materials chemists. As detailed above, the synthetic method can affect the surface chemistry of resulting films, and contrasting reports on the hydrophobicity of cerium oxide indicate that a detailed study on AACVD of CeO2 films is required in order to gain further insight into the hydrophobic nature and potential antisoiling properties of the films. This study investigates the synthesis of cerium oxide thin films via AACVD using a precursor complexed with an ancillary donor ligand.



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